PECVD Tube Furnace 1200°C w/ mass flow controller & vacuum pump

PECVD Tube Furnace

PECVD stands for Plasma Enhanced Chemical Vapor Deposition. This PECVD Tube Furnace comes with 1200°C maximum temperature and up to 1100°C continuous working temperature. Overall PECVD tube furnace assembly consists of a Quartz tube furnace, RF plasma source, 4 channels gas mixing tank and high capacity vacuum pump. PECVD tube furnaces are used for fabrication of thin films and coatings for numerous applications ranging from optics and optoelectronics to aerospace, automotive, biomedical, microelectronics, and others. We manufacture these furnaces with reliable branded parts and supply all India and export at competitive price.

Technical Specifications

Maximum temperature	1200°C
Continuous working temperature	1100°C
Heating tube	Quartz
Available tube heating zone length	200 / 350 / 440 mm
Available tube OD	40 / 60 / 100 mm
Heating element	Resistance wire heating element
Temperature controller	Programmable PID temperature controller Single program & 30 segments Auto-tuning function
Thermocouple	K Type
Heating zone construction	High alumina ceramic fiber
Power supply	410V/50Hz
Plasma RF Power Supply	5-300W adjustable
RF frequency	13.56 MHz
Reflection power	200W
Vacuum pump	Heavy duty oil filled vacuum pump
Mass flow meter	4 channel gas mixing mass flow meter

Tube Furnace